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Jack Lesseter

Jack LasseterThesis Topic

Nanoscale Manipulation of Two-Dimensional Transition Metal Dichalcogenide Semiconductors via Focused Electron Beam Induced Etching

Thesis

My proposal is on the focused electron-beam induced etching (FEBIE) of transition metal dichalcogenides, such as WS2. Two-dimensional transition metal dichalcogenides (TMDs) have intriguing optoelectronic properties and thus are actively researched for their potential in next-generation devices. Recently we demonstrated that MoS2 can be successfully etched, and as WF6 is a volatile molecule, we expect WS2 and WSe2 2D materials can also be etched. Using the new IAMM PFIB microscope with an advanced gas injection system, we will investigate the effect of electron energy, current, dwell time and correlate the etch rate and resolution with a focus on the impact to optoelectronic properties.

Biography

My research career started in undergrad at Middle Tennessee State University in Murfreesboro, TN. Now I am a 4th year PhD student in the Materials Science and Engineering program at UTK focusing on direct-write processing in scanning electron microscopes for my dissertation. In my free time I like to run outside with my dog, play PC games with my wife, and pet my extremely vocal cat.